SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Optimization of processing parameters and metrology for novel NCA negative resists for NGL
Wood, Obert R., Panning, Eric M., Singh, Vikram, Satyanarayana, V. S. V., Kessler, Felipe, Scheffer, Francine R., Weibel, Daniel E., Sharma, Satinder K., Ghosh, Subrata, Gonsalves, Kenneth E.Volume:
9048
Year:
2014
Language:
english
DOI:
10.1117/12.2045882
File:
PDF, 1.38 MB
english, 2014