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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Performance optimization of MOPA pre-pulse LPP light source
Wood, Obert R., Panning, Eric M., Schafgans, Alexander A., Brown, Daniel J., Fomenkov, Igor V., Sandstrom, Rick, Ershov, Alex, Vaschenko, Georgiy, Rafac, Rob, Purvis, Michael, Rokitski, Slava, Tao, YeVolume:
9422
Year:
2015
Language:
english
DOI:
10.1117/12.2087421
File:
PDF, 955 KB
english, 2015