SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Patterning of hyperbranched resist materials by e-beam
Trimble, Alexander R., Tully, David C., Frechet, Jean M. J., Medeiros, David R., Angelopoulos, Marie, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388286
File:
PDF, 496 KB
english, 2000