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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - PREVAIL: IBM's e-beam technology for next generation lithography
Pfeiffer, Hans C., Dobisz, Elizabeth A.Volume:
3997
Year:
2000
Language:
english
DOI:
10.1117/12.390056
File:
PDF, 3.75 MB
english, 2000