SPIE Proceedings [SPIE Optical/Laser Microlithography IV - San Jose, United States (Wednesday 6 March 1991)] Optical/Laser Microlithography IV - Poly(bis-alkylthio-acetylen): a dual-mode laser-sensitive material
Baumann, Reinhard R., Bargon, Joachim, Roth, Hans-Klaus, Pol, VictorVolume:
1463
Year:
1991
Language:
english
DOI:
10.1117/12.44831
File:
PDF, 491 KB
english, 1991