SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Ultra-thick lithography for advanced packaging and MEMS
Brubaker, Chad, Islam, Rafiqul, Luesebrink, Helge, Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474225
File:
PDF, 169 KB
english, 2002