SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - The novel approach for optical proximity correction using genetic algorithms
Matsunawa, Tetsuaki, Nosato, Hirokazu, Sakanashi, Hidenori, Murakawa, Masahiro, Murata, Nobuharu, Terasawa, Tsuneo, Tanaka, Toshihiko, Yoshioka, Nobuyuki, Suga, Osamu, Higuchi, Tetsuya, Weed, J. TracyVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.632041
File:
PDF, 570 KB
english, 2005