SPIE Proceedings [SPIE SPIE Proceedings - (Sunday 12 February 2012)] - Low-temperature annealing of ion-doped layers of silicon in hydrogen atom flow
Kagadei, V., Nefyodtsev, E., Romanenko, S., Valiev, Kamil A., Orlikovsky, Alexander A.Year:
2012
Language:
english
DOI:
10.1117/12.676913
File:
PDF, 392 KB
english, 2012