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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Fundamental limits to EUV photoresist
Gallatin, Gregg M., Naulleau, Patrick, Brainard, Robert, Lin, QinghuangVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.712346
File:
PDF, 287 KB
english, 2007