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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Two-fluid cleaning technology for advanced photomask
Kikuchi, Tsutomu, Kobayashi, Nobuo, Kurokawa, Yoshiaki, Hirose, Harumichi, Nonaka, Mikio, Hosono, KunihiroVolume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.830602
File:
PDF, 812 KB
english, 2009