SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Characterization of line-edge roughness (LER) propagation from resists: underlayer interfaces in ultrathin resist films
George, Simi A., Naulleau, Patrick P., Krishnamoorthy, Ahila, Wu, Zeyu, Rutter, Jr., Edward W., Kennedy, Joseph T., Xie, Song Yuan, Flanigan, Kyle Y., Wallow, Thomas I., La Fontaine, Bruno M.Volume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.848405
File:
PDF, 8.06 MB
english, 2010