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SPIE Proceedings [SPIE 27th European Mask and Lithography Conference - Dresden, Germany (Tuesday 18 January 2011)] 27th European Mask and Lithography Conference - Multilayer reticles: advantages and challenges for 28nm chip making
Hotzel, Arthur, Seltmann, Rolf, Busch, Jens, Cotte, Eric, Behringer, Uwe F.W.Volume:
7985
Year:
2011
Language:
english
DOI:
10.1117/12.885690
File:
PDF, 6.16 MB
english, 2011