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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Coherent Fourier scatterometry: tool for improved sensitivity in semiconductor metrology
Kumar, N., El Gawhary, O., Roy, S., Kutchoukov, V. G., Pereira, S. F., Coene, W., Urbach, H. P., Starikov, AlexanderVolume:
8324
Year:
2012
Language:
english
DOI:
10.1117/12.916357
File:
PDF, 2.01 MB
english, 2012