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Formation of nanosize silicides films on the Si(111) and Si(100) surfaces by low-energy ion implantation
Rysbaev, A. S., Khuzhaniyazov, Zh. B., Rakhimov, A. M., Bekpulatov, I. R.Volume:
59
Language:
english
Journal:
Technical Physics
DOI:
10.1134/s1063784214100272
Date:
October, 2014
File:
PDF, 306 KB
english, 2014