Roles of Ions and Radicals in Silicon Oxide Etching

Japanese Journal of Applied Physics 1990 / 10 Vol. 29; Iss. Part 1, No

Roles of Ions and Radicals in Silicon Oxide Etching

Ikegami, Naokatsu, Ozawa, Nobuo, Miyakawa, Yasuhiro, Konishi, Mamoru, Kanamori, Jun
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.29.2236
Date:
October, 1990
File:
PDF, 875 KB
1990
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