Quantum Wire Fabrication by E-Beam Elithography Using...

Japanese Journal of Applied Physics 1992 / 12 Vol. 31; Iss. Part 1, No

Quantum Wire Fabrication by E-Beam Elithography Using High-Resolution and High-Sensitivity E-Beam Resist ZEP-520

Nishida, Toshio, Notomi, Masaya, Iga, Ryuzo, Tamamura, Toshiaki
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Volume:
31
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.31.4508
Date:
December, 1992
File:
PDF, 1.87 MB
1992
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