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Amorphous Se 75 Ge 25 Resist Profile Simulation of Focused-Ion-Beam Lithography
Lee, Hyun-Yong, Chung, Hong-BayVolume:
36
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.36.2409
Date:
April, 1997
File:
PDF, 1003 KB
1997