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Low-energy Ion-scattering Spectroscopic Analysis of Structural Damage in Si Substrate under Ultrathin SiO 2 after Gate Etching
Matsui, Miyako, Uchida, Fumihiko, Tokunaga, Takafumi, Enomoto, Hiroyuki, Umezawa, TadashiVolume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.38.2124
Date:
April, 1999
File:
PDF, 262 KB
english, 1999