A Study of Loading Effect during Electron-Beam Exposure and...

Japanese Journal of Applied Physics 1999 / 12 Vol. 38; Iss. Part 1, No

A Study of Loading Effect during Electron-Beam Exposure and Etching Process in Photomask Fabrication

Choi, Ji-Hyeon, Kim, Byung-Gook, Jeon, Chan-Uk, Cho, Sung-Yong, Choi, Seong-Woon, Sohn, Jung-Min
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Volume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.38.6981
Date:
December, 1999
File:
PDF, 357 KB
english, 1999
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