Metalorganic Chemical Vapor Deposition of Copper Using...

Japanese Journal of Applied Physics 2002 / 5 Vol. 41; Iss. Part 1, No

Metalorganic Chemical Vapor Deposition of Copper Using (Hexafluoroacetylacetonate)Cu (I) (3,3-dimethyl-1-butene) with a Liquid Delivery System

Choi, Kyeong-Keun, Pyo, Sung G., Lee, Dok Won, Rhee, Shi-Woo
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Volume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.41.2962
Date:
May, 2002
File:
PDF, 958 KB
english, 2002
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