High-Rate Deposition of Intrinsic Amorphous Silicon Layers...

Japanese Journal of Applied Physics 2006 / 4 Vol. 45; Iss. 4B

High-Rate Deposition of Intrinsic Amorphous Silicon Layers for Solar Cells Using Very High Frequency Plasma at Atmospheric Pressure

Kakiuchi, Hiroaki, Ohmi, Hiromasa, Kuwahara, Yasuhito, Matsumoto, Mitsuhiro, Ebata, Yusuke, Yasutake, Kiyoshi, Yoshii, Kumayasu, Mori, Yuzo
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Volume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.45.3587
Date:
April, 2006
File:
PDF, 159 KB
english, 2006
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