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Hydrogenated Amorphous Silicon Layer Formation by Inductively Coupled Plasma Chemical Vapor Deposition and Its Application for Surface Passivation of p-Type Crystalline Silicon
Dao, Vinh Ai, Duy, Nguyen Van, Heo, Jongkyu, Choi, Hyungwook, Kim, Youngkuk, Lakshminarayan, Lakshminarayan, Yi, JunsinVolume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.48.066509
Date:
June, 2009
File:
PDF, 2.00 MB
english, 2009