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Proximity Effect Correction for Mask Writing Taking Resist...

Proximity Effect Correction for Mask Writing Taking Resist Development Processes into Account

Abe, Takayuki, Matsumoto, Hiroshi, Shibata, Hayato, Motosugi, Tomoo, Kato, Yasuo, Ohnishi, Takayuki, Yashima, Jun, Iijima, Tomohiro, Anze, Hirohito
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Volume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.48.095004
Date:
September, 2009
File:
PDF, 353 KB
english, 2009
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