Proximity Effect Correction for Mask Writing Taking Resist Development Processes into Account
Abe, Takayuki, Matsumoto, Hiroshi, Shibata, Hayato, Motosugi, Tomoo, Kato, Yasuo, Ohnishi, Takayuki, Yashima, Jun, Iijima, Tomohiro, Anze, HirohitoVolume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.48.095004
Date:
September, 2009
File:
PDF, 353 KB
english, 2009