New Stacked Metal–Insulator–Metal Capacitor with High...

Japanese Journal of Applied Physics 2011 / 4 Vol. 50; Iss. 4

New Stacked Metal–Insulator–Metal Capacitor with High Capacitance Density for Future InP-Based ICs

Tsutsumi, Takuya, Sugitani, Suehiro, Nishimura, Kazumi, Ida, Minoru
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Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.50.04df09
Date:
April, 2011
File:
PDF, 757 KB
english, 2011
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