Gallium Nitride Film Growth Using a Plasma Based Migration Enhanced Afterglow Chemical Vapor Deposition System
Butcher, K. Scott A., Kemp, Brad W., Hristov, Ilian B., Terziyska, Penka, Binsted, Peter W., Alexandrov, DimiterVolume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.51.01af02
Date:
January, 2012
File:
PDF, 780 KB
english, 2012