Process Optimization of Dielectric CVD Film for Patterning...

ECS Transactions 2013 / 03 Vol. 52; Iss. 1

Process Optimization of Dielectric CVD Film for Patterning Related Defect Reduction at 28nm Technology

Deng, H., Zhang, B., Xiang, Y. H., Guo, S., Tong, H., Yan, Y., Zhang, B.
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Volume:
52
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/05201.0409ecst
Date:
March, 2013
File:
PDF, 1.50 MB
english, 2013
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