The Use of Dopants for Defect Monitoring for...

ECS Transactions 2014 / 08 Vol. 64; Iss. 6

The Use of Dopants for Defect Monitoring for Silicon-Germanium Ultra-High Vaccuum Chemical Vapor Deposition

Hazbun, R., Hart, J., Nakos, J., Siegel, D., Funch, C., Kaushal, V., Hazel, D. S., Kolodzey, J.
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Volume:
64
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/06406.0441ecst
Date:
August, 2014
File:
PDF, 1.50 MB
english, 2014
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