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Analysis of Experimental Data for Metallic Impurity Out-Diffusion from Deep-UV Photoresist
Yang, Tian-Shiang, Hsu, Nien-Tzong, Chen, Kuo-Shen, Ko, Fu-HsiangVolume:
151
Year:
2004
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1640631
File:
PDF, 600 KB
english, 2004