Postoxidation Annealing Treatments to Improve Si/Ultrathin...

Journal of The Electrochemical Society 2004 Vol. 151; Iss. 12

Postoxidation Annealing Treatments to Improve Si/Ultrathin SiO[sub 2] Characteristics Formed by Nitric Acid Oxidation

Asuha,, Liu, Yueh-Ling, Maida, Osamu, Takahashi, Masao, Kobayashi, Hikaru
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Volume:
151
Year:
2004
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1809594
File:
PDF, 116 KB
english, 2004
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