A Shallow and Deep Trench Isolation Process Module for RF...

Journal of The Electrochemical Society 2004 Vol. 151; Iss. 12

A Shallow and Deep Trench Isolation Process Module for RF BiCMOS

Forsberg, Markus, Johansson, Ted, Liu, Wei, Vellaikal, Manoj
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Volume:
151
Year:
2004
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1811596
File:
PDF, 1.29 MB
english, 2004
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