Contamination Removal by Single-Wafer Spin Cleaning with Repetitive Use of Ozonized Water and Dilute HF
Hattori, TakeshiVolume:
145
Year:
1998
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1838798
File:
PDF, 2.21 MB
english, 1998