[ECS 208th ECS Meeting - Los Angeles, California (October 16-October 21, 2005)] ECS Transactions - Electromigration in sub-micron Copper Interconnects in Low-k Dielectrics
Agarwala, Birendra, Chanda, Kaushik, Rathore, H. S., Nguyen, Du, Hu, Chao-Kun, Mclaughlin, Paul, Demarest, James, Clevenger, Lawrence, Yang, Chih-ChaoVolume:
1
Year:
2006
Language:
english
DOI:
10.1149/1.2218480
File:
PDF, 369 KB
english, 2006