Analysis of Post-Chemical-Mechanical-Polishing Cleaning...

Analysis of Post-Chemical-Mechanical-Polishing Cleaning Mechanisms for Improving Time-Dependent Dielectric Breakdown Reliability

Yamada, Yohei, Yagi, Yasuhito, Konishi, Nobuhiro, Ogiso, Naohito, Katsuyama, Kiyomi, Asaka, Shoji, Noguchi, Junji, Miyazaki, Tadakazu
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Volume:
155
Year:
2008
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2888470
File:
PDF, 1.31 MB
english, 2008
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