Thermal Annealing Effects on the Atomic Layer Deposited...

Electrochemical and Solid-State Letters 2008 Vol. 11; Iss. 7

Thermal Annealing Effects on the Atomic Layer Deposited LaAlO[sub 3] Thin Films on Si Substrate

Eom, Dail, Hwang, Cheol Seong, Kim, Hyeong Joon, Cho, Mann-Ho, Chung, K. B.
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Volume:
11
Year:
2008
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.2916437
File:
PDF, 610 KB
english, 2008
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