Fabrication of Robust Triple-Ti[sub 1−x]Al[sub x]N Metal Gate by Atomic Layer Deposition
Jeon, Sanghun, Park, SunghoVolume:
157
Year:
2010
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3496032
File:
PDF, 404 KB
english, 2010