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ECS Transactions [ECS 219th ECS Meeting - Montreal, QC, Canada (May 1 - May 6, 2011)] - III-V MOSFETs: Surface Passivation, Source/Drain and Channel Strain Engineering, Self-Aligned Contact Metallization
Yeo, Yee-Chia, Chin, Hock-Chun, Gong, Xiao, Guo, Huaxin, Zhang, XinguiYear:
2011
Language:
english
DOI:
10.1149/1.3569928
File:
PDF, 1.22 MB
english, 2011