The Inhibition of Enhanced Cu Oxidation on Ruthenium∕Diffusion Barrier Layers for Cu Interconnects by Carbon Alloying into Ru
Ding, Shao-Feng, Xie, Qi, Müeller, Steve, Waechtler, Thomas, Lu, Hai-Sheng, Schulz, Stefan E., Detavernier, Christophe, Qu, Xin-Ping, Gessner, ThomasVolume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/2.041112jes
File:
PDF, 365 KB
english, 2011