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Role of interaction forces in controlling the stability and polishing performance of CMP slurries
G.Bahar Basim, Ivan U Vakarelski, Brij M MoudgilVolume:
263
Year:
2003
Language:
english
Pages:
10
DOI:
10.1016/s0021-9797(03)00201-7
File:
PDF, 581 KB
english, 2003