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Chemical vapor deposition of silicon–germanium heterostructures
S Bozzo, J.-L Lazzari, C Coudreau, A Ronda, F Arnaud d’Avitaya, J Derrien, S Mesters, B Hollaender, P Gergaud, O ThomasVolume:
216
Year:
2000
Language:
english
Pages:
14
DOI:
10.1016/s0022-0248(00)00429-2
File:
PDF, 601 KB
english, 2000