Model of boron incorporation into silicon epitaxial film in...

Model of boron incorporation into silicon epitaxial film in a B2H6–SiHCl3–H2 system

Hitoshi Habuka, Toru Otsuka, Wei-Feng Qu, Manabu Shimada, Kikuo Okuyama
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Volume:
222
Year:
2001
Language:
english
Pages:
11
DOI:
10.1016/s0022-0248(00)00911-8
File:
PDF, 254 KB
english, 2001
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