Reactive ion etching of Si1−xGex alloy with hydrogen...

Journal of Crystal Growth 2001 Vol. 227-228; Iss. none

Reactive ion etching of Si1−xGex alloy with hydrogen bromide

Lin Guo, Kaicheng Li, Daoguang Liu, Yihong Ou, Jing Zhang, Qiang Yi, Shiliu Xu
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
227-228
Year:
2001
Language:
english
Pages:
4
DOI:
10.1016/s0022-0248(01)00864-8
File:
PDF, 123 KB
english, 2001
Conversion to is in progress
Conversion to is failed