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Preparation and properties of TiSi2 thin films from TiCl4/H2 by plasma enhanced chemical vapor deposition
O.A. Fouad, M. Yamazato, M. Era, M. Nagano, T. Hirai, I. UsuiVolume:
234
Year:
2002
Language:
english
Pages:
7
DOI:
10.1016/s0022-0248(01)01707-9
File:
PDF, 360 KB
english, 2002