Plasma sputtering of silicon dioxide substrate by low...

Plasma sputtering of silicon dioxide substrate by low energy Ar ion bombardment: molecular dynamics simulation

Dong Ho Kim, Seung Yup Lee, Do Hyun Kim
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Volume:
237-239
Year:
2002
Language:
english
Pages:
6
DOI:
10.1016/s0022-0248(01)01905-4
File:
PDF, 170 KB
english, 2002
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