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Fabrication of epitaxial In2O3(ZnO)5 thin films by RF sputtering and their characterization by X-ray and electron diffraction techniques
Naoki Ohashi, Tsuyoshi Ogino, Isao Sakaguchi, Shunichi Hishita, Mamabu Komatsu, Tadashi Takenaka, Hajime HanedaVolume:
237-239
Year:
2002
Language:
english
Pages:
6
DOI:
10.1016/s0022-0248(01)01980-7
File:
PDF, 233 KB
english, 2002