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New Si atomic-layer-controlled growth technique with thermally cracked hydride molecule
Yoshiyuki Suda, Naoyuki Hosoya, Daiju ShiratoriVolume:
237-239
Year:
2002
Language:
english
Pages:
6
DOI:
10.1016/s0022-0248(01)02225-4
File:
PDF, 143 KB
english, 2002