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The reactive ion etching of Bi2Ti2O7 thin films on silicon substrates and its image in atomic force microscopy: [J. Crystal Growth 235 (2001) 411–414]
Zhuo Wang, Daliang Sun, Jifan Hu, Deliang Cui, Xiaohong Xu, Dong Wang, Yin Zhang, Min Wang, Hong Wang, Huanchu Chen et al.Volume:
240
Year:
2002
DOI:
10.1016/s0022-0248(02)00939-9
File:
PDF, 36 KB
2002