Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films
Dennis M. Hausmann, Roy G. GordonVolume:
249
Year:
2003
Language:
english
Pages:
11
DOI:
10.1016/s0022-0248(02)02133-4
File:
PDF, 791 KB
english, 2003