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RF-plasma enhanced CVD of TiSi2 thin films: effects of TiCl4 flow rate and RF power
Osama A. Fouad, Nizam MD Uddin, Masaaki Yamazato, Masamitsu NaganoVolume:
257
Year:
2003
Language:
english
Pages:
8
DOI:
10.1016/s0022-0248(03)01419-2
File:
PDF, 371 KB
english, 2003