Self-limiting monolayer epitaxy (SME): a new approach to...

Self-limiting monolayer epitaxy (SME): a new approach to the growth of wide gap II-VI heterostructures

W. Faschinger, P. Juza, S. Ferreira, H. Zajicek, A. Pesek, H. Sitter, K. Lischka
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Volume:
128
Year:
1993
Language:
english
Pages:
5
DOI:
10.1016/s0022-0248(07)80012-1
File:
PDF, 346 KB
english, 1993
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