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Control of thin film structure by reactant pressure in atomic layer deposition of TiO2
Jaan Aarik, Aleks Aidla, Väino Sammelselg, Hele Siimon, Teet UustareVolume:
169
Year:
1996
Language:
english
Pages:
7
DOI:
10.1016/s0022-0248(96)00423-x
File:
PDF, 640 KB
english, 1996